Energy, Electronic engineering, Electronics

Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 2: Determination of Oxygen impurities in Nitrogen, Argon, Helium, Neon and Hydrogen using a galvanic cell

Draft standard 2025-07

DIN 50450-2:2025-07 - Draft

Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 2: Determination of Oxygen impurities in Nitrogen, Argon, Helium, Neon and Hydrogen using a galvanic cell

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Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of oxygen impurity in N₂, Ar, He, Ne and H₂ by using a galvanic cell

Standard [CURRENT] 1991-03

DIN 50450-2:1991-03

Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of oxygen impurity in N₂, Ar, He, Ne and H₂ by using a galvanic cell

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Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 9: Determination of oxygen, nitrogen, carbonmonoxide, carbondioxide, hydrogen and C₁-C₃-hydrocarbons in gaseous hydrogen chloride by gaschromatography

Standard [CURRENT] 2021-07

DIN 50450-9:2021-07

Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 9: Determination of oxygen, nitrogen, carbonmonoxide, carbondioxide, hydrogen and C₁-C₃-hydrocarbons in gaseous hydrogen chloride by gaschromatography

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Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS

Standard [CURRENT] 2014-11

DIN 50451-3:2014-11

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS

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Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 4: Determination of 34 elements in ultra pure water by mass spectrometry with inductively coupled plasma (ICP-MS)

Standard [CURRENT] 2024-09

DIN 50451-4:2024-09

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 4: Determination of 34 elements in ultra pure water by mass spectrometry with inductively coupled plasma (ICP-MS)

This document specifies a test method for determining the mass fractions of 34 elements in the extreme trace range in ultrapure water, using inductively coupled plasma mass spectrometry (ICP-MS) ...

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Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram

Standard [CURRENT] 2022-08

DIN 50451-5:2022-08

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 5: Guideline for the selection of materials and testing of their suitability for apparatus for sampling and sample preparation for the determination of trace elements in the range of micrograms per kilogram and nanograms per kilogram

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Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 6: Determination of 36 elements in a high-purity ammonium fluoride solution (NH₄F) and in etching mixtures of high-purity ammonium fluoride solution containing hydrofluoric acid

Standard [CURRENT] 2014-11

DIN 50451-6:2014-11

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 6: Determination of 36 elements in a high-purity ammonium fluoride solution (NH₄F) and in etching mixtures of high-purity ammonium fluoride solution containing hydrofluoric acid

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Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 7: Determination of 31 elements in high-purity hydrochloric acid by ICP-MS

Standard [CURRENT] 2018-04

DIN 50451-7:2018-04

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 7: Determination of 31 elements in high-purity hydrochloric acid by ICP-MS

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from 63.27 EUR VAT excluded

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Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 8: Determination of 33 elements in high-purity sulfuric acid by ICP-MS

Standard [CURRENT] 2022-08

DIN 50451-8:2022-08

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 8: Determination of 33 elements in high-purity sulfuric acid by ICP-MS

from 60.10 EUR VAT included

from 56.17 EUR VAT excluded

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