Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of oxygen impurity in N₂, Ar, He, Ne and H₂ by using a galvanic cell
German title
Prüfung von Materialien für die Halbleitertechnologie; Bestimmung von Verunreinigungen in Träger- und Dotiergasen; Bestimmung der Sauerstoffverunreinigung in Stickstoff, Argon, Helium, Neon und Wasserstoff mittels einer galvanischen Meßzelle
Publication date
1991-03
Original language
German
Pages
2
Publication date
1991-03
Original language
German
Pages
2
DOI
https://dx.doi.org/10.31030/2406706
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ICS
29.045,
71.100.20
DOI
https://dx.doi.org/10.31030/2406706
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