Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 9: Determination of oxygen, nitrogen, carbonmonoxide, carbondioxide, hydrogen and C₁-C₃-hydrocarbons in gaseous hydrogen chloride by gaschromatography
German title
Prüfung von Materialien für die Halbleitertechnologie - Bestimmung von Verunreinigungen in Träger - und Dotiergasen - Teil 9: Bestimmung von Sauerstoff, Stickstoff, Kohlenstoffmonooxid, Kohlenstoffdioxid, Wasserstoff und C₁-C₃-Kohlenwasserstoffen in Chlorwasserstoff mit Gaschromatographie
Publication date
2003-04
Original language
German
Pages
5
Publication date
2003-04
Original language
German
Pages
5
DOI
https://dx.doi.org/10.31030/9451435
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