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This document has been prepared by Working Committee NA 027-03-03 AA "Fertigungsmittel für Mikrosysteme" ("Production equipment for microsystems") at the Standards Committee Optics and Precision Mechanics (NAFuO) at DIN. DIN 32567-5 specifies methods for the optical topographic measurement of the layer thickness of layer systems in which the layer and substrate have different optical properties, with which the systematic deviations of the measured layer thickness can be determined. This standard primarily aims at the material pairing of soft, yielding layers on hard, stiff substrates. The most important prerequisite for the application of the draft standard is the possibility of topographic layer thickness measurement; that is, the layer must be measurable as a profile step.