We use cookies to make our websites more user-friendly and to continuously improve them. If you continue to use the website, you consent to the use of cookies. You can find more information in our privacy statement and our cookie guidelines.

Standards Worldwide
Standards Worldwide
Phone +49 30 58885700-07

Standard [CURRENT]

DIN 50453-2:2023-08

Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 2: Silicon-dioxide coating, optical method

German title
Prüfung von Materialien für die Halbleitertechnologie - Bestimmung der Ätzrate von Ätzmischungen - Teil 2: Siliciumdioxid-Schichten, Optisches Verfahren
Publication date
2023-08
Original language
German
Pages
9

from 49.20 EUR VAT included

from 45.98 EUR VAT excluded

Format and language options

PDF download

  • 49.20 EUR

Shipment (3-5 working days)

  • 59.40 EUR

Monitor with the Standards Ticker

This option is only available after login.
Easily subscribe: Save time and money now!

You can also subscribe to this document - together with other important standards in your industry. This makes your work easier and pays for itself after a short time.

Sparschwein_data
Subscription advantages
Sparschwein Vorteil 1_data

Important standards for your industry, regularly updated

Sparschwein Vorteil 2_data

Much cheaper than buying individually

Sparschwein Vorteil 3_data

Useful functions: Filters, version comparison and more

Publication date
2023-08
Original language
German
Pages
9
DOI
https://dx.doi.org/10.31030/3434121

Product information on this site:

Quick delivery via download or delivery service

Buy securely with a credit card or pay upon receipt of invoice

All transactions are encrypted

Content
ICS
29.045
DOI
https://dx.doi.org/10.31030/3434121
Replacement amendments

This document replaces DIN 50453-2:1990-10 .

Cooperation at DIN

Loading recommended items...
Loading recommended items...
Loading recommended items...
Loading recommended items...