Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
German title
Richtlinie für die Messung von Schnittstellenbreiten bei der Aufstäubungstiefenprofilierung mit Hilfe der Sekundärionen-Massenspektroskopie
Publication date
2011
reapproved: 2019
Original language
English
Pages
3
Publication date
2011
reapproved: 2019
Original language
English
Pages
3
DOI
https://dx.doi.org/10.1520/E1438-11R19
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Short description
1.1 This guide provides the SIMS analyst with a method for determining the width of interfaces from SIMS sputtering data obtained from analyses of layered specimens. This guide does not apply to data obtained from analyses of specimens with thin markers or specimens without interfaces such as ion-implanted specimens. 1.2 This guide does not describe methods for the optimization of interface width or the optimization of depth resolution. This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.