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Standard [CURRENT]

SN EN 62047-25:2016-11

Semiconductor devices - Micro-electromechanical devices - Part 25: Silicon-based MEMS fabrication technology - Measurement method of pull-press and shearing strength of micro bonding area

German title
Halbleiterbauelemente - Bauelemente der Mikrosystemtechnik - Teil 25: Siliziumbasierte MEMS-Herstellungstechnologie - Messverfahren zur Zug-Druck- und Scherfestigkeit gebondeter Flächen im Mikrometerbereich
Publication date
2016-11
Original language
German
Pages
21

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Publication date
2016-11
Original language
German
Pages
21

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