Semiconductor devices - Micro-electromechanical devices - Part 21: Test method for Poisson's ratio of thin film MEMS materials (IEC 62047-21:2014); German version EN 62047-21:2014
German title
Halbleiterbauelemente - Bauelemente der Mikrosystemtechnik - Teil 21: Prüfverfahren zur Querkontraktionszahl von Dünnschichtwerkstoffen der Mikrosystemtechnik (IEC 62047-21:2014); Deutsche Fassung EN 62047-21:2014
Publication date
2015-04
Original language
German
Pages
16
Publication date
2015-04
Original language
German
Pages
16
DOI
https://dx.doi.org/10.31030/2286392
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ICS
31.080.01,
31.220.01
DOI
https://dx.doi.org/10.31030/2286392
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