Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials
German title
Chemische Oberflächenanalyse. Sekundärionenmassenspektrometrie. Bestimmung des Elementgehalts von Bor in Silizium unter Verwendung gleichförmig dotierter Materialien
Publication date
2010-08-31
Original language
English
Pages
30
Publication date
2010-08-31
Original language
English
Pages
30
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